Organic Polymers
Poly(vinyl alcohol), Solstice
CAS: 9002-89-5 Molecular Formula: (C2H4O)n Molecular Weight (g/mol): 44.05 MDL Number: MFCD00081922 InChI Key: IMROMDMJAWUWLK-UHFFFAOYSA-N Synonym: vinyl alcohol,polyvinyl alcohol,hydroxyethene,hydroxyethylene,ethenol, homopolymer,gohsenol,polyviol,elvanol,mowiol,poval PubChem CID: 11199 IUPAC Name: ethenol SMILES: OC(-*)C-*
Starch Solution, Solstice
Indicator, 1% in H2O
KAYAKU ADVANCED MATERIALS INC S1813 Positive Photoresist, 1 QT, Red Amber liquid
KAYAKU ADVANCED MATERIALS S1813 Positive Photoresist is a high-performance positive photoresist designed for microelectronic device fabrication. This material is essential for creating precise patterns on substrates such as in semiconductor manufacturing and integrated circuit prototyping. The formulation is engineered with a toxicologically safer solvent, providing a reliable solution for photolithographic processes.
- Ensures high resolution and pattern definition for nanoscale patterning.
- Offers excellent coating properties with striation-free, uniform coatings.
- Optimized for g-line exposure and effective with broad-band light sources.
- Compatible with both metal-ion-free and metal-ion-bearing developers.
- Dyed versions minimize notching and maintain linewidth control, enhancing process yield.
KAYAKU ADVANCED MATERIALS INC SU-8 3025, negative epoxy-based photoresist, 500 mL, high chemical resistance, for microfabrication applications, imaging wavelength: near UV (350-400 nm), viscosity 4400 cP, density 1.143 g/mL
SU-8 3025, negative epoxy-based photoresist, 500 mL, high chemical resistance, for microfabrication applications, imaging wavelength: near UV (350-400 nm), viscosity 4400 cP, density 1.143 g/mL
KAYAKU ADVANCED MATERIALS INC MRT - MA-P 1275G - 500ML GLASS
NC3360329 MRT - MA-P 1275G - 500ML GLASS